As semiconductor and electronic device sizes shrink to the nanoscale, contamination from ever smaller particles become critical to high yield and high performance. This contamination can take the form of dust, tiny particles of abrasive material left behind by polishing processes, airborne pollution[...]
This volume chronicles the proceedings of the Fourth International Symposium on Silanes and Other Coupling Agents held under the aegis of MST Conferences, LLC in Orlando, FL, June 11-13, 2003.
Silanes have been used for about half a century as coupling agents / adhesion promoters to promote adhes[...]