Materials Science of Thin Films

When Ohring's Materials Science of Thin Films was first published in 1992, there were already at least 200 existing books on various aspects of thin film science and technology, but Ohring was quickly recognized as the first true textbook on the subject specifically intended for senior/graduate leve [...]
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When Ohring's Materials Science of Thin Films was first published in 1992, there were already at least 200 existing books on various aspects of thin film science and technology, but Ohring was quickly recognized as the first true textbook on the subject specifically intended for senior/graduate level classroom use in universities, as well as industrial in-house or short courses offered by professional societies. It offers the most comprehensive coverage of materials science and technology related to thin films and coatings of any book in the field. Partly because of that and because of the author's engaging writing style, Materials Science of Thin Films has been, and continues to be, the leading textbook in the field. The 3rd edition has been capably revised by Dr. Daniel Gall, associate professor of materials science and engineering at RPI, and Dr. Shefford Baker, associate professor of materials science and engineering at Cornell University. Content has been updated to include coverage of the latest and most important deposition techniques, including atomic layer deposition and high impulse magnetron sputtering.It includes new or expanded coverage of recent developments in thin films technology, such as filtered cathodic arcs, nanorod growth by the vapor-liquid-solid process, carbon nanotubes, new quantitative kinetic nucleation models, atomic-level growth classifications, bi-textured layers, surface morphological evolution models, and competitive grain growth.